FACILITIES AND RESOURCES
Technical And Scientific Resources
A well equipped semiconductor research laboratory is available, comprising 150m2 of air conditioned laboratory space with a clean room rating of class 10-100.
Microelectronics processing facilities include:
- Nine fume cupboards
- Spin rinser
- Deionised water
- Fifteen diffusion and oxidation furnaces (for wafers up to 125 mm diameter)
- Three liquid phase epitaxy (LPE) furnaces
- Two photolithographic mask aligners and resist spinners
- Two metal evaporation systems
- Electroplating equipment
- A laser scriber with x-y table and IR & green emission
- Two high speed dicing saws
- LPCVD system for silicon nitride
Characterisation facilities includes:
- Electron and optical microscopes
- IV testers
- Spectral response analyser
- photoconductive decay contactless lifetime tester
- Deep level transient spectroscopy
- CV tester
- Secondary ion mass spectrometer
- Hall effect
- Polaron differential C-V analyser
- X-ray diffraction
- Photoluminescence
- Surface profiler
- Fourier transform infrared spectroscopy
- Spectrophotometers with integrating spheres
- Rutherford backscattering
- Raman spectroscopy
- ANU Supercomputer Facility
- The information on this page was updated on 19 November 2003.
- Please direct enquiries regarding technical difficulties on this page to the Web Master.
- This page has been authorised by the Director, CSES, as relevant officer.
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