FACILITIES AND RESOURCES

Technical And Scientific Resources

A well equipped semiconductor research laboratory is available, comprising 150m2 of air conditioned laboratory space with a clean room rating of class 10-100.

Microelectronics processing facilities include:

  • Nine fume cupboards
  • Spin rinser
  • Deionised water
  • Fifteen diffusion and oxidation furnaces (for wafers up to 125 mm diameter)
  • Three liquid phase epitaxy (LPE) furnaces
  • Two photolithographic mask aligners and resist spinners
  • Two metal evaporation systems
  • Electroplating equipment
  • A laser scriber with x-y table and IR & green emission
  • Two high speed dicing saws
  • LPCVD system for silicon nitride

 

Characterisation facilities includes:

  • Electron and optical microscopes
  • IV testers
  • Spectral response analyser
  • photoconductive decay contactless lifetime tester
  • Deep level transient spectroscopy
  • CV tester
  • Secondary ion mass spectrometer
  • Hall effect
  • Polaron differential C-V analyser
  • X-ray diffraction
  • Photoluminescence
  • Surface profiler
  • Fourier transform infrared spectroscopy
  • Spectrophotometers with integrating spheres
  • Rutherford backscattering
  • Raman spectroscopy
  • ANU Supercomputer Facility

The information on this page was updated on 19 November 2003.
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